Coating and Developing Equipment ACS300 Gen2
Type up to 300mm - Spin Coating/Developing Cluster
Wafer-level packaging for mass production and 3D integration.
- Company：ズース・マイクロテック
- Price：Other
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Coating and Developing Equipment ACS200
Fully automatic, compatible with a maximum of 200mm.
By docking our mask aligner module with the full-area exposure method, it can be used as the Ring Graphy Cluster LithoFab200.
- Company：ズース・マイクロテック
- Price：Other
